chemical vapor deposition film

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• chemical vapor deposition film — cheminiu gariniu būdu nusodinta plėvelė statusas T sritis radioelektronika atitikmenys: angl. chemical vapor deposition film vok. chemische Gasphasenabscheidungschicht, f rus. плёнка, полученная химическим осаждением из паровой фазы, f pranc.… …   Radioelektronikos terminų žodynas

• Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C …   Wikipedia

• Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

• Chemical vapor deposition of diamond — Colorless gem cut from diamond grown by chemical vapor deposition Chemical vapor deposition of diamond or CVD is a method of producing synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in …   Wikipedia

• Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

• Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… …   Wikipedia

• Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …   Wikipedia

• Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

• Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

• film déposé par dépôt chimique en phase vapeur — cheminiu gariniu būdu nusodinta plėvelė statusas T sritis radioelektronika atitikmenys: angl. chemical vapor deposition film vok. chemische Gasphasenabscheidungschicht, f rus. плёнка, полученная химическим осаждением из паровой фазы, f pranc.… …   Radioelektronikos terminų žodynas

• Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… …   Wikipedia